EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE

EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide an exposure apparatus for reducing defocus which may be caused by deformation on a pattern surface of an original plate for instance. SOLUTION: The exposure apparatus including a projecting optical system for projecting light from the original plate to expose a subst...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: TSUJIHASHI HIDEYUKI
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide an exposure apparatus for reducing defocus which may be caused by deformation on a pattern surface of an original plate for instance. SOLUTION: The exposure apparatus including a projecting optical system for projecting light from the original plate to expose a substrate through the pattern surface of the original plate and the projecting optical system comprises a detection means for respectively detecting a plurality of positions on the pattern surface in the optical axis direction of the projecting optical system and a means for applying force to the original plate in a direction orthogonal to the pattern surface, wherein the force applying means is allowed to generate force so that the plurality of positions on the pattern surface which are detected by the detection means are included within a predetermined allowable range. COPYRIGHT: (C)2009,JPO&INPIT