MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor device which suppresses the difference in color, based on a film thickness of a photosensitive polyimide film. SOLUTION: The method includes a process to measure beforehand the color of photosensitive polyimide, having the sp...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SETO KEIJI, FURUMURA MASATO, TAKAHARA MASAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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