PHOTO BASE GENERATING AGENT, PHOTOSENSITIVE RESIN COMPOSITION, ARTICLE, AND NEGATIVE TYPE PATTERN FORMATION METHOD

PROBLEM TO BE SOLVED: To provide a new photo base generating agent which has photoreaction activity in a wavelength region of ≥400 nm, and to provide a photosensitive resin composition which is highly sensitive and gives high solubility contrast without relating to the kinds of polymer precursors. S...

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Hauptverfasser:	FUKUDA TOSHIHARU, SAKAYORI KATSUYA
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMICAL PAINT OR INK REMOVERS CHEMISTRY CINEMATOGRAPHY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS CORRECTING FLUIDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FILLING PASTES HETEROCYCLIC COMPOUNDS HOLOGRAPHY INKS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC CHEMISTRY ORIGINALS THEREFOR PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS POLISHES SEMICONDUCTOR DEVICES USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a new photo base generating agent which has photoreaction activity in a wavelength region of ≥400 nm, and to provide a photosensitive resin composition which is highly sensitive and gives high solubility contrast without relating to the kinds of polymer precursors. SOLUTION: Provided is this photo base generating agent represented by formulas (1A) to (1C), and the photosensitive resin composition comprising the photo base generating agent and a polymer precursor. Therein, Raand Rbare each independently H, a halogen atom, hydroxy, mercapto, nitro, silyl, silanol, or a monovalent organic group; Rcgroups are each independently H, or a monovalent organic group, provided that at least one of Rcgroups is the monovalent organic group. COPYRIGHT: (C)2009,JPO&INPIT