SOLID-STATE IMAGE PICKUP ELEMENT AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To solve the problem that, when an impurity region is formed in a substrate by ion implantation, by implanting impurities at an angle to the surface of a semiconductor substrate, the impurity region is formed at a position deviated from design and the difference from the design...

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Bibliographische Detailangaben
1. Verfasser:	OIKAWA MUNETOSHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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