MICROCHIP MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a microchip manufacturing method capable of forming a functional film in the inner surface of a channel and jointing microchip substrates made of resin to one another. SOLUTION: A groove 2 for channels extending along the surface of a microchip substrate 1, made of r...

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Bibliographische Detailangaben
Hauptverfasser: SEKIHARA MIKIJI, KAMIHIRA MASAYOSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a microchip manufacturing method capable of forming a functional film in the inner surface of a channel and jointing microchip substrates made of resin to one another. SOLUTION: A groove 2 for channels extending along the surface of a microchip substrate 1, made of resin, is formed in the surface of the microchip substrate 1. A microchip substrate 4 is a plate-like substrate. Surface roughness Ra of the surface of the microchip substrate 1, other than the inner surface of the groove 2 for channels, is equal to the film thickness T1 of an SiO2film 3 formed in the surface or larger. With the surface in which the groove 2 for channels turned to the inside, the microchip substrates 1 and 4 are overlaid and jointed to each other by applying ultrasonic waves. COPYRIGHT: (C)2009,JPO&INPIT