METHOD FOR CLEANING CERAMIC PANEL OR INORGANIC HEAT-RESISTING SUBSTRATE, ELEMENT MANUFACTURING METHOD USING THE SAME, AND ELEMENT

METHOD FOR CLEANING CERAMIC PANEL OR INORGANIC HEAT-RESISTING SUBSTRATE, ELEMENT MANUFACTURING METHOD USING THE SAME, AND ELEMENT

PROBLEM TO BE SOLVED: To provide a substrate cleaning method for removing abrasion residues from the surfaces of substrates and acquiring clean substrate surfaces. SOLUTION: An alumina substrate abraded by a silicon carbide (SiC) abrasive material or the like is impregnated with a fused salt acquire...

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Bibliographische Detailangaben
Hauptverfasser: MIZUHATA MINORU, DEKI SHIGETO, SAKAMOTO MUNEAKI
Format: Patent
Sprache:eng
Schlagworte:
CLEANING
CLEANING IN GENERAL
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PERFORMING OPERATIONS
PHYSICS
PREVENTION OF FOULING IN GENERAL
TESTING
TRANSPORTING
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate cleaning method for removing abrasion residues from the surfaces of substrates and acquiring clean substrate surfaces. SOLUTION: An alumina substrate abraded by a silicon carbide (SiC) abrasive material or the like is impregnated with a fused salt acquired by heating sodium carbonate and lithium carbonate to 500-800°C and mixing them to remove residues of an inorganic abrasive material present in the surfaces of the alumina substrate. Then a film electrode made of platinum or a platinum alloy and a heater made of platinum or a platinum alloy are formed in the surfaces of the alumina substrate from which residues of the inorganic abrasive material have been removed. COPYRIGHT: (C)2008,JPO&INPIT