METHOD OF MANUFACTURING GALLIUM NITRIDE-SYSTEM COMPOUND SEMICONDUCTOR LIGHT-EMITTING DEVICE
PROBLEM TO BE SOLVED: To provide a method of manufacturing a gallium nitride-system compound semiconductor light-emitting device whose emission intensity is high and whose drive power voltage is low. SOLUTION: According to this manufacturing method, a supply ratio (M/III) of an n-type dopant and a g...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | PROBLEM TO BE SOLVED: To provide a method of manufacturing a gallium nitride-system compound semiconductor light-emitting device whose emission intensity is high and whose drive power voltage is low. SOLUTION: According to this manufacturing method, a supply ratio (M/III) of an n-type dopant and a group III element at the time of growing up a barrier layer is controlled so as to reside in a range of 4.5×10-7≤(M/III) |
---|