PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTOSPACER, SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE USING THE SAME, AND LIQUID CRYSTAL DISPLAY DEVICE

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a photospacer which is not accompanied by air bubbles even in the case of an ODF mode liquid crystal injection, which has a panel forming margin, which is not accompanied by air bubbles even under low temperature, and which scar...

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Hauptverfasser: SAITO TAKUMI, YATO YOSHIKI, NAKANO YOSHIHIRO, DEMACHI YASUYUKI, SARUWATARI YOSHIYUKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a photospacer which is not accompanied by air bubbles even in the case of an ODF mode liquid crystal injection, which has a panel forming margin, which is not accompanied by air bubbles even under low temperature, and which scarcely produce a display defect even subjected to pressure from outside, a substrate for liquid crystal display device, and a liquid crystal display device. SOLUTION: The photosensitive resin composition for the photospacer contains a resin formed by adding a polymercapto compound represented by general formula (2) to a portion of a (meth)acrylate group of a polyfunctional (meth)acrylate compound represented by general formula (1) on a carbon-carbon double bond on a β-position with respect to a carbonyl group, and contains a resin formed by adding a carboxyl substituted mercapto compound represented by general formula (3) to a portion of a (meth)acrylate group remaining on the polyfunctional (meth)acrylate compound which has not reacted with the polymercapto compound represented by general formula (2). COPYRIGHT: (C)2008,JPO&INPIT