POLYHEMIACETAL ESTER, COMPOSITION FOR CURED RESIN AND METHOD FOR DEGRADING CURED RESIN

PROBLEM TO BE SOLVED: To provide a degradable cured resin having advantageous heat resistance, solvent resistance, stability as the cured resin, having excellent degradability of the backbone thereof by heating or irradiating a light and capable of being easily removed; a composition for a cured res...

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Bibliographische Detailangaben
Hauptverfasser: KYO YOSHITETSU, HISHIDA YUKIKO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a degradable cured resin having advantageous heat resistance, solvent resistance, stability as the cured resin, having excellent degradability of the backbone thereof by heating or irradiating a light and capable of being easily removed; a composition for a cured resin as a raw material for the resin; as well as a novel polyhemiacetal ester capable of being preferably utilized for the composition and method for producing the polyhemiacetal ester. SOLUTION: The polyhemiacetal ester of the present invention comprises a recurring unit represented by formula (1) (wherein, R1represents a cyclohexyl group or phenyl group; R2represents a (1-20C) hydrocarbon group; and R3represents an alkyl (meth)acrylate group having a (1-10C) alkyl group) and has a number average molecular weight of 1,000 to 20,000. The composition for a cured resin of the present invention is characterized by containing the polyhemiacetal ester, a curing agent having in one molecule thereof, one or more polymerizable vinyl group and a heat- or photo acid-generating agent. COPYRIGHT: (C)2008,JPO&INPIT