CLEANING APPARATUS

PROBLEM TO BE SOLVED: To provide a cleaning apparatus easily cleaning and carrying a large mask substrate with a compact cleaning tub, not requiring a large work space, with preferable operability. SOLUTION: A portal substrate operation part of the cleaning apparatus has a substrate elevating part f...

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Bibliographische Detailangaben
Hauptverfasser: FUJIOKA YUTAKA, HARASAKI TADAHARU, TAKISHITA KAZUHIRO, INOUE KAZUYASU, TOZAWA HIRONORI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a cleaning apparatus easily cleaning and carrying a large mask substrate with a compact cleaning tub, not requiring a large work space, with preferable operability. SOLUTION: A portal substrate operation part of the cleaning apparatus has a substrate elevating part forming a portal form straddling the cleaning tub 60, lowering a large glass substrate 85 in the cleaning tub 60, and elevating the lowered large glass substrate 85 from the cleaning tub 60; and a substrate carrying part moving in relation to the cleaning tub 60, and moves on two guide rails 40-1, 2 set on both sides of the cleaning tub 60. COPYRIGHT: (C)2008,JPO&INPIT