PATTERN INSPECTION METHOD AND DEVICE

PROBLEM TO BE SOLVED: To preclude a subtle edge part difference from being detected as a defect candidate or a defect, when forming a pattern unavoidable on a process in an edge part, and to maintain high detection capability with respect to non-edge part defects. SOLUTION: This pattern inspection m...

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1. Verfasser: NAKAKUKI HIDEKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To preclude a subtle edge part difference from being detected as a defect candidate or a defect, when forming a pattern unavoidable on a process in an edge part, and to maintain high detection capability with respect to non-edge part defects. SOLUTION: This pattern inspection method includes a process for detecting the pattern having two-dimensional repeatability of an object to be inspected, as a two-dimensional image signal; a process for converting the two-dimensional image signal into a two-dimensional digital image signal; a process for putting a pixel of a comparison point 102 of a comparison object in a pixel separated by integral number of times of a pattern pitch along the crossing direction of a marked point 101, as to the marked point 101 in the two-dimensional digital image signal; a process for calculating the maximum value and the minimum value, based on the pixels of respective points 103 in the vicinity of the four comparison points 102; and a process for determining that the pixel of the marked point 101 is a normal part, when it comes within a range added with a preset allowance value, in a range from a minimum value to a maximum value, and that the point is a defect candidate, when lying outside thereof. COPYRIGHT: (C)2008,JPO&INPIT