SUBSTRATE LAMINATING METHOD, MANUFACTURING METHOD OF MICROCHIP, AND THE MICROCHIP

PROBLEM TO BE SOLVED: To provide a substrate laminating method that has superior productivity, causes no deformation of channel patterns, even if a fine channel pattern is formed on a substrate, and to provide a manufacturing method of microchips, and microchips with the deformation of a fluid circu...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: SHIMAZAKI TAKAAKI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate laminating method that has superior productivity, causes no deformation of channel patterns, even if a fine channel pattern is formed on a substrate, and to provide a manufacturing method of microchips, and microchips with the deformation of a fluid circuit controlled. SOLUTION: The method for laminating a first substrate (101), consisting of a thermoplastic resin through which light transmits and a second substrate (102) consisting of a thermoplastic resin in which a light-absorbing substance is dispersed, comprises steps of (A) adjusting the temperature of the laminated surface, of at least one of substrates close to the glass transition temperature of the thermoplastic resin that constitutes the substrate by a heating plate (104), and the like, (B) applying pressure on the superimposed first substrate (101) and the second substrate (102), and (C) irradiating a light (105) to the light-absorbing substance via the first substrate. COPYRIGHT: (C)2008,JPO&INPIT