SUBSTRATE HOLDING APPARATUS

PROBLEM TO BE SOLVED: To wash away, for example, a polishing liquid intruding into a gap formed between an outer peripheral surface of an elastic pad and a retainer ring to prevent deposits of the polishing liquid from being stuck in the gap. SOLUTION: The substrate holding apparatus 1 for holding a substrate W to be polished and pressing the substrate W against a polishing surface 101 comprises: a top ring body 2 for holding the substrate W; the retainer ring 3 fixed to or integrated in a lower end of a periphery of the top ring body 2; and an elastic pad 4 brought in contact with the substrate W; and support member 6 disposed in a space formed inside the retainer ring 3. The top ring body 2 is provided with a cleaning liquid passage 51 to supply a cleaning liquid into the gap G formed between the outer peripheral surface of the elastic pad 4 and the retainer ring 3, in which a through-hole 3a is provided in the retainer ring 3 to remove the cleaning liquid outward. COPYRIGHT: (C)2008,JPO&INPIT