METHOD AND SYSTEM FOR EVALUATING EVALUATED PATTERN OF MASK

PROBLEM TO BE SOLVED: To provide a method, a system and a computer program product for evaluating an evaluated pattern of a mask. SOLUTION: The method includes: receiving multiple moments that represent an image of the evaluated pattern, wherein a size of information required for representing the mu...

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Bibliographische Detailangaben
Hauptverfasser:	BRAUDE CHAIM, BEN-YISHAI MICHAEL, SCHWARZBAND ISHAI, GREENBERG GADI, MANGAN SHMOOLIK
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method, a system and a computer program product for evaluating an evaluated pattern of a mask. SOLUTION: The method includes: receiving multiple moments that represent an image of the evaluated pattern, wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern. COPYRIGHT: (C)2008,JPO&INPIT