MANUFACTURING METHOD OF PLATE EXCELLENT IN SLIPPERINESS

PROBLEM TO BE SOLVED: To provide a plate excellent in slip properties which is suitably utilizable for a commodity display rack over a long term. SOLUTION: In the manufacturing method of the plate excellent in slipperiness to form the unevenness pattern of which the dynamic friction coefficient is 0...

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Bibliographische Detailangaben
Hauptverfasser: SATO YASUNARI, SATO KUNIYUKI, NAGAO TETSUO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a plate excellent in slip properties which is suitably utilizable for a commodity display rack over a long term. SOLUTION: In the manufacturing method of the plate excellent in slipperiness to form the unevenness pattern of which the dynamic friction coefficient is 0.3 or less on a plane surface, it is characterized in that the unevenness pattern film has following configurations: (1) the unevenness pattern has substantially uniform depth and height; (2) the unevenness pattern has the linked network structure in at least one portion between the convex parts;(3) the height difference of the convex part and the depression part is 10-500 μm; and (4) the average width between the convex parts is 500-2,000 μm. COPYRIGHT: (C)2008,JPO&INPIT