METHOD AND DEVICE FOR INSPECTION, LITHOGRAPHIC DEVICE, LITHOGRAPHIC PROCESSING CELL, AND METHOD FOR MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide a fault detection/classification system without increasing complicatedness in calculation and a calculation time caused thereby, in other words, that uses as many data points as possible without reducing a throughput of substrates in a lithographic device. SOLUTION:...

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Hauptverfasser:	MOS EVERHARDUS CORNELIS, SCHAAR MAURITS VAN DER, HOOGENBOOM THOMAS LEO MARIA, DEN BOEF ARIE JEFFREY
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS SEMICONDUCTOR DEVICES TESTING
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a fault detection/classification system without increasing complicatedness in calculation and a calculation time caused thereby, in other words, that uses as many data points as possible without reducing a throughput of substrates in a lithographic device. SOLUTION: An abnormality detection/classification method that checks dispersion in a raw data using a raw back-focal-plane image data of radiation from a substrate surface detected by a scatterometer detector, and associates the variation in the raw data that may possibly occur in the lithographic device or a fault that may possibly occur in a process where the substrate surface is patterned is disclosed. The association is performed by comparing the variation in the raw data with known metrological data. After the fault is checked, a user can receive the information on the fault. COPYRIGHT: (C)2008,JPO&INPIT