EXPOSURE EQUIPMENT, MAINTENANCE METHOD, AND METHOD OF MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide exposure equipment which can suppress deterioration of the performance, since the performance of the equipment easily deteriorates since bacteria may possibly be generated, because of a liquid remaining in a member in oil immersion exposure equipment, and if the gene...

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Bibliographische Detailangaben
Hauptverfasser:	NAGASAKA HIROYUKI, YAMATO SOICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide exposure equipment which can suppress deterioration of the performance, since the performance of the equipment easily deteriorates since bacteria may possibly be generated, because of a liquid remaining in a member in oil immersion exposure equipment, and if the generation of the bacteria is left standing, pollution expands to generate poor exposure. SOLUTION: Exposure equipment EX is a projection exposure equipment of liquid immersion exposure type. The equipment exposes a substrate P to an exposure light EL via a liquid LQ, with which the space between the lowermost stream of a projection system and the substrate is filled. The exposure equipment EX comprises a bactericidal device 11, which discharges an electromagnetic wave which makes the bacteria annihilates. COPYRIGHT: (C)2008,JPO&INPIT