PHOTOSENSITIVE RESIN COMPOSITION AND COLOR FILTER USING THE SAME

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a color filter capable of satisfying both of good adhesion in development and no residue after development. SOLUTION: The photosensitive resin composition comprises (A) an unsaturated group-containing alkali-soluble resin compou...

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Hauptverfasser:	YAMADA TAICHIRO, KANEMITSU AKIRA, SASAKI KENRYO, FUJISHIRO KOICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a color filter capable of satisfying both of good adhesion in development and no residue after development. SOLUTION: The photosensitive resin composition comprises (A) an unsaturated group-containing alkali-soluble resin compound represented by general formula (1), (B) a photopolymerizable monomer having at least one ethylenically unsaturated bond, (C) a photopolymerization initiator, (D) a pigment, (E) an auxiliary dispersant and (F) a dispersant as essential components, wherein a weight ratio between the components (A) and (B), (A)/(B) is 60:40 to 90:10, contents of the components (C) and (D) are 2-30 pts.wt. and 100-200 pts.wt., respectively, based on 100 pts.wt., in total, of the components (A) and (B), a content of the component (E) having an acid value of 0-30 is 2.5-50 mass% of the component (D), and a content of the component (F) is 1-50 mass% of the component (D). COPYRIGHT: (C)2008,JPO&INPIT