CLEANING DEVICE AND MANUFACTURING METHOD OF OPTICAL FILM

PROBLEM TO BE SOLVED: To provide a cleaning device which has a simple structure and which is capable of wiping and cleaning the periphery of a discharge port of a coater and of using under application working environment with high cleanliness. SOLUTION: The cleaning device is provided with a cleanin...

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Bibliographische Detailangaben
Hauptverfasser:	MINAMINO DAIKI, SHIMIZU NAOKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a cleaning device which has a simple structure and which is capable of wiping and cleaning the periphery of a discharge port of a coater and of using under application working environment with high cleanliness. SOLUTION: The cleaning device is provided with a cleaning member to wipe the periphery of the discharge port of the coater, a supply means to store and supply the cleaning member and a wiping means to transfer, rub and wipe the cleaning member to the lengthwise direction of the coater. COPYRIGHT: (C)2008,JPO&INPIT