DRAWING METHOD AND RECTANGULAR REGION DIVIDING METHOD IN ELECTRON BEAM DRAWING

PROBLEM TO BE SOLVED: To provide a drawing method and a rectangular region dividing method in electron beam drawing capable of preventing generation of a non-drawing portion and preventing occurrence of problems such as drawing irregularity or formation of stripes in the entire drawn image and degra...

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Bibliographische Detailangaben
Hauptverfasser:	NAKADA NAOKO, NARUKAWA TERUSATO, TAKIGAWA TADAHIKO, ISHIKAWA MIKIO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a drawing method and a rectangular region dividing method in electron beam drawing capable of preventing generation of a non-drawing portion and preventing occurrence of problems such as drawing irregularity or formation of stripes in the entire drawn image and degradation in LER (line edge roughness). SOLUTION: The electron beam drawing with a spot beam comprises drawing an object drawing region while irradiating and scanning the object drawing region with a spot beam, wherein a part of the scan pitch of the spot beam is irradiated with a pitch narrower than the preliminarily determined scan pitch to form an overlapped drawing portion. COPYRIGHT: (C)2008,JPO&INPIT