LITHOGRAPHY SYSTEM, DEVICE MANUFACTURING METHOD, SETPOINT DATA OPTIMIZATION METHOD, AND APPARATUS FOR GENERATING OPTIMIZED SETPOINT DATA

PROBLEM TO BE SOLVED: To improve the accuracy of a device structure formed by a maskless lithography system. SOLUTION: A method of producing optimized setpoint data for controlling the element operation of an array of individually controllable elements in a maskless system, and systems therefor are...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TINNEMANS PATRICIUS ALOYSIUS J, ALBRIGHT RONALD P, HINTERSTEINER JASON D, HENDRICUS HOEKS MARTINUS H, KASTRUP BERNARDO, CEBUHAR WENCESLAO A, KARS ZEGER TROOST
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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