LITHOGRAPHY SYSTEM, DEVICE MANUFACTURING METHOD, SETPOINT DATA OPTIMIZATION METHOD, AND APPARATUS FOR GENERATING OPTIMIZED SETPOINT DATA

PROBLEM TO BE SOLVED: To improve the accuracy of a device structure formed by a maskless lithography system. SOLUTION: A method of producing optimized setpoint data for controlling the element operation of an array of individually controllable elements in a maskless system, and systems therefor are...

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Hauptverfasser:	TINNEMANS PATRICIUS ALOYSIUS J, ALBRIGHT RONALD P, HINTERSTEINER JASON D, HENDRICUS HOEKS MARTINUS H, KASTRUP BERNARDO, CEBUHAR WENCESLAO A, KARS ZEGER TROOST
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Zusammenfassung:	PROBLEM TO BE SOLVED: To improve the accuracy of a device structure formed by a maskless lithography system. SOLUTION: A method of producing optimized setpoint data for controlling the element operation of an array of individually controllable elements in a maskless system, and systems therefor are provided. Optimization is based on an estimated device structure and/or an estimated dose pattern that utilize one or more of the following factors: the low-pass characteristics of a projection system, the configuration of an illumination system, and the process window characteristics. COPYRIGHT: (C)2008,JPO&INPIT