LITHOGRAPHIC EQUIPMENT AND LITHOGRAPHIC METHOD

PROBLEM TO BE SOLVED: To provide a lithographic equipment and a lithographic method which can reduce generation of bubbles in liquid. SOLUTION: The lithographic equipment comprises a substrate table for holding a substrate, a projection system which is arranged to project a radiation beam patterned...

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Bibliographische Detailangaben
Hauptverfasser:	MONDT EVA, BERNHARD SPERLING FRANK, VAN DEN DOOL TEUNIS CORNELIS, ZDRAVKOV ALEXANDER NIKOLOV, AUER-JONGEPIER SUZAN LEONIE, VISSERS PAULUS MARTINUS HUBERTUS, JEROEN JOHANNES SOPHIA MARIA MERTENS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a lithographic equipment and a lithographic method which can reduce generation of bubbles in liquid. SOLUTION: The lithographic equipment comprises a substrate table for holding a substrate, a projection system which is arranged to project a radiation beam patterned on the substrate, a liquid supplying system prepared to supply liquid to a space between the projection system, the substrate and the substrate table, and a ring placed to cover a gap between the substrate and the substrate table and made contact with both of them. COPYRIGHT: (C)2008,JPO&INPIT