SUPPORTING STRUCTURE OF WAFER HOLDER

PROBLEM TO BE SOLVED: To provide a highly reliable supporting structure of a wafer holder, capable of preventing damage of a wafer holder in addition to uniformly heating a wafer. SOLUTION: The supporting structure supports a wafer holder 1 having an electric circuit embedded in a ceramic sintered b...

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Bibliographische Detailangaben
Hauptverfasser:	AWAZU TOMOYUKI, NATSUHARA MASUHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a highly reliable supporting structure of a wafer holder, capable of preventing damage of a wafer holder in addition to uniformly heating a wafer. SOLUTION: The supporting structure supports a wafer holder 1 having an electric circuit embedded in a ceramic sintered body or on its surface with a cylindrical supporting member 3. In the supporting structure, a flange part 2 having a thread formed thereon is attached on the wafer holder 1 with a plurality of screws 4, and a thread provided on the cylindrical supporting member 3 is mated with the thread of the flange part 2. The cylindrical supporting member 3 mated with the flange part 2 is fixed with rotation preventing pins 5. COPYRIGHT: (C)2008,JPO&INPIT