LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a liquid supply system for hooking a liquid meniscus at a predetermined position in a space between the final element and the substrate of a projection system. SOLUTION: Disclosed is a liquid immersion system used for a liquid immersion lithography in which a liquid...

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Hauptverfasser:	LIEBREGTS PAULUS MARTINUS MARIA, MONDT EVA, STEFFENS KOEN, RIEPEN MICHEL, BERKVENS PAUL PETRUS JOANNES, BRANDS GERT-JAN GERARDUS JOHANEES THOMAS, CHRISTIAAN ALEXANDER HOOGENDAM, SIMONS WILHELMUS FRANCISCUS JOHANNES, DIREKS DANIEL JOSEPH MARIA, LEMPENS HAN HENRICUS ALDEGONDA, VAN DER HAM RONALD
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a liquid supply system for hooking a liquid meniscus at a predetermined position in a space between the final element and the substrate of a projection system. SOLUTION: Disclosed is a liquid immersion system used for a liquid immersion lithography in which a liquid meniscus between the liquid immersion system and its substrate is substantially hooked at a predetermined position by meniscus hook formation. The meniscus hook formation has a plurality of discrete outlets arranged in polygonal shape. COPYRIGHT: (C)2008,JPO&INPIT