METHOD OF AND APPARATUS FOR PRODUCING POLYCRYSTALLINE SILICON

PROBLEM TO BE SOLVED: To provide a method of and an apparatus for producing polycrystalline silicon which can easily decompose and treat a polymer, suppress the loss of a chlorine source and maintain soundness of equipment. SOLUTION: This method comprises a step of reacting trichlorosilane with hydr...

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1. Verfasser:	TAKE MASAYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY COMPOSITIONS BASED THEREON COMPOUNDS THEREOF INORGANIC CHEMISTRY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY NON-METALLIC ELEMENTS ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method of and an apparatus for producing polycrystalline silicon which can easily decompose and treat a polymer, suppress the loss of a chlorine source and maintain soundness of equipment. SOLUTION: This method comprises a step of reacting trichlorosilane with hydrogen and producing silicon and an efflux comprising monosilanes (formula SiHnCl4-n: n=0-4) including tetrachlorosilane and a polymer containing at least trisilanes and tetrasilanes, and a step of feeding the efflux and hydrogen into a conversion reactor 2 and heating at a temperature range of 600-1,400°C to react the tetrachlorosilane to be converted into trichlorosilane and the polymer to be converted into monosilanes. COPYRIGHT: (C)2008,JPO&INPIT