CONTROL METHOD OF VAPOR DEPOSITION FILM THICKNESS OF WEB-SHAPED VAPOR DEPOSITION MATERIAL

PROBLEM TO BE SOLVED: To provide a control method of the vapor deposition film thickness of a web-shaped vapor deposition material capable of reducing losses and enhancing the productivity by realizing the uniform vapor-deposited film thickness between a low rate and a stationary rate when starting the vapor deposition. SOLUTION: A vapor-deposited film thickness detection means detects the thickness of a vapor-deposited film on a surface of a web-shaped vapor-deposited material in a vacuum vapor deposition apparatus for performing the vapor deposition on at least one surface of the web-shaped vapor-deposited material which is continuous under reduced pressure by using a heating means for heating and evaporating a vapor deposition material. In the control method of the vapor deposition film thickness of the web-shaped vapor deposition material, when controlling the vapor-deposited film thickness based on the value detected by the vapor-deposited film thickness detection means, the traveling speed of the web-shaped vapor-deposited material is controlled based on the deviation between the detected value of the vapor-deposited film thickness detection means and the target film thickness while the power introduced for heating and evaporating the vapor deposition material is increased step by step by a preset program during the acceleration before the traveling speed of the web-shaped vapor-deposited material reaches the traveling speed at the stationary vapor deposition from the start of the vapor deposition. COPYRIGHT: (C)2008,JPO&INPIT