LAYERED SILICATE BEING PRECURSOR OF CDO-TYPE HIGH SILICA ZEOLITE, AND METHOD FOR MANUFACTURING THE SAME

PROBLEM TO BE SOLVED: To provide a crystalline layered silicate being a precursor of CDO-type high silica zeolite, and to provide a method for manufacturing the crystalline layered silicate. SOLUTION: In the method for manufacturing the crystalline layered silicate being the precursor, a mixture, wh...

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Hauptverfasser: KAYAMORI SHUNSUKE, MIZUKAMI FUJIO, YAMAMOTO KATSUTOSHI, IKEDA TAKUSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a crystalline layered silicate being a precursor of CDO-type high silica zeolite, and to provide a method for manufacturing the crystalline layered silicate. SOLUTION: In the method for manufacturing the crystalline layered silicate being the precursor, a mixture, which is obtained by adding an aqueous solution of diethyldimethylammonium hydroxide (DEDMAOH) to H-type kanemite obtained by acid treating crystalline layered silicate kanemite so that the molar ratio of DEDMAOH to Si becomes 0.10-0.15 and the molar ratio of H2O to Si becomes 5-8, is charged into a pressure container, and is subjected to a solid-phase reaction at a prescribed temperature in a steam atmosphere for 24-48 h. The CDO-type high silica zeolite having a high specific surface area is obtained by subjecting the obtained crystalline layered silicate used as the precursor to dehydropolycondensation by heating it. Thereby, the new crystalline layered silicate used as the precursor of the CDO-type high silica zeolite, the method for manufacturing the same, a method for manufacturing the CDO-type high silica zeolite and new CDO-type high silica zeolite can be provided. COPYRIGHT: (C)2008,JPO&INPIT