SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a highly reliable semiconductor device in which the permeation of water and hydrogen into a capacitor structure is prevented as much as possible, and influence on a dielectric behavior, variation in contact resistance, and the like are suppressed by forming an interl...

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Bibliographische Detailangaben
1. Verfasser: IZUMI TAKATOSHI
Format: Patent
Sprache:eng
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