PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To suppress irregularities generated in a pattern when forming the pattern comprising a plurality of linear pattern elements by discharging a pattern forming material from a plurality of discharge ports. SOLUTION: The pattern forming apparatus 1 comprises a nozzle part 5 provid...

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1. Verfasser: YABE MANABU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To suppress irregularities generated in a pattern when forming the pattern comprising a plurality of linear pattern elements by discharging a pattern forming material from a plurality of discharge ports. SOLUTION: The pattern forming apparatus 1 comprises a nozzle part 5 provided with the plurality of discharge ports and a stage moving mechanism 2 for moving a substrate 9 to the nozzle part 5. Since the substrate 9 is moved while the pattern forming material is continuously discharged from the plurality of discharge ports of the nozzle part 5, the pattern comprising the plurality of linear and rib-like pattern elements arrayed at equal pitches on the substrate 9 is formed. In the pattern forming apparatus 1, the temperature of the pattern forming material to be discharged is irregularly changed by using a heater inside the nozzle part 5 while the pattern is formed, and thus the viscosity of the pattern forming material is irregularly changed. As a result, the way of spreading of the pattern forming material before it is cured on the substrate 9 is irregularly changed and the irregularities generated in a striped pattern are suppressed. COPYRIGHT: (C)2008,JPO&INPIT