SYSTEM AND METHOD FOR PROTECTING RETICLE USING TWO-PART COVER

PROBLEM TO BE SOLVED: To provide a system and a method for protecting a mask from being contaminated by airborne particles. SOLUTION: These system and method include a step of providing a reticle which is fixed inside a two-part cover. The two-part cover includes a removable protection device for pr...

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Hauptverfasser:	ALIKHAN ABDULLAH, FEROCE JONATHAN H, MASSAR ANDREW, LOOPSTRA ERIC R, KISH DUANE P, OLSON WOODROW J, DEL PUERTO SANTIAGO
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CONVEYING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HANDLING THIN OR FILAMENTARY MATERIAL HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PACKING PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PNEUMATIC TUBE CONVEYORS SEMICONDUCTOR DEVICES SHOP CONVEYOR SYSTEMS STORING TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a system and a method for protecting a mask from being contaminated by airborne particles. SOLUTION: These system and method include a step of providing a reticle which is fixed inside a two-part cover. The two-part cover includes a removable protection device for protecting the reticle from contaminants. The cover is held inside a pod or box, which may be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover may be removed during an exposure process, during which a pattern on the reticle is formed on a wafer. COPYRIGHT: (C)2008,JPO&INPIT