INSPECTION METHOD, INSPECTION SYSTEM, INSPECTION PROGRAM, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE

PROBLEM TO BE SOLVED: To provide an inspection method wherein defect causes in an electronic device are easily checked and identified by non-destruction, and to provide a method of manufacturing the electronic device that employs the same. SOLUTION: The inspection method includes the steps of (S102)...

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Bibliographische Detailangaben
Hauptverfasser: TERAMOTO RYUICHI, ONOE SEIJI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an inspection method wherein defect causes in an electronic device are easily checked and identified by non-destruction, and to provide a method of manufacturing the electronic device that employs the same. SOLUTION: The inspection method includes the steps of (S102) recording QC data accompanying each process of manufacturing the electronic device in a data storage device, (S103) standardizing the QC data of each process to be stored in a common database, (S104) preparing a distribution map showing the QC data of each process from the standardized data, (S106) selecting singularities from the distribution map to generate a singularity map, (S110) comparing the singularity map with a defect cause map related to a product, and (S111) identifying defects from a process, wherein the defect is caused, based on the comparison. COPYRIGHT: (C)2008,JPO&INPIT