PROJECTION EXPOSURE DEVICE

PROBLEM TO BE SOLVED: To provide a projection exposure device capable of partitioning an exposing exposure region with an excellent response and with a high accuracy. SOLUTION: The projection exposure device 11 has a mercury lamp 13 generating an illuminating light 31 required for an exposure to for...

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Bibliographische Detailangaben
1. Verfasser:	TAKAGI TOSHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a projection exposure device capable of partitioning an exposing exposure region with an excellent response and with a high accuracy. SOLUTION: The projection exposure device 11 has a mercury lamp 13 generating an illuminating light 31 required for an exposure to form a pattern on a wafer 12 by photolithography technology, and a reticle 22 having a pattern image for forming a pattern on a wafer 12. The projection exposure device further has a liquid crystal blind 19 controlling an exposure region irradiating the reticle 22 and having a 1 shot and a stage 25 placing and fixing the wafer 12. The liquid crystal blind 19 is constituted by arranging a plurality of liquid crystal cells in a matrix shape, and the exposure region is determined by controlling the state of the orientation of liquid crystal molecules in the liquid crystal cells. COPYRIGHT: (C)2008,JPO&INPIT