SPECIMEN PROCESSING METHOD AND DEVICE

PROBLEM TO BE SOLVED: To form a film having a sharp edge via a simple process by using a charged particle beam device. SOLUTION: From the shape of a halo component 33 formed during deposition processing, such an ion beam irradiation profile (dose distribution) on a processing target as forms a sharp edge when the halo component 33 is removed is obtained. Using the dose distribution per ion beam irradiation in etching, an irradiation position and a dose distribution of ion beams are calculated so that approximation to the processing target dose distribution is obtained. Etching processing is carried out by radiating ion beams according to the calculated irradiation position and dose distribution while blowing etching gas toward a glass substrate 34. In this way, ion beams are radiated according to the dose distribution 35 and the sharp edge is obtained to a deposition film 32. COPYRIGHT: (C)2008,JPO&INPIT