NON-CHEMICALLY-AMPLIFIED MAIN CHAIN DECOMPOSITION TYPE POSITIVE RESIST COMPOSITION

PROBLEM TO BE SOLVED: To provide a non-chemically-amplified main chain decomposition type positive resist composition having good coating properties and capable of preventing intermixing with another organic layer. SOLUTION: The non-chemically-amplified main chain decomposition type positive resist...

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Bibliographische Detailangaben
Hauptverfasser:	TANAKA YUKIHIKO, NIIHORI HIROSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a non-chemically-amplified main chain decomposition type positive resist composition having good coating properties and capable of preventing intermixing with another organic layer. SOLUTION: The non-chemically-amplified main chain decomposition type positive resist composition is obtained by dissolving a base resin component (A) of which the main chain is decomposed upon exposure to light to increase solubility in a developer in at least one organic solvent selected from ethyl lactate, methyl-3-methoxypropionate and γ-butyrolactone, wherein the base resin component (A) is preferably based on one or more selected from the group consisting of constitutional units represented by general formula (a-1) and constitutional units represented by general formula (a-2). COPYRIGHT: (C)2008,JPO&INPIT