ETCHING SOLUTION AND METHOD FOR PRODUCING BLACK MATRIX

PROBLEM TO BE SOLVED: To provide an etching solution which is superior in etching precision, can provide a black matrix without causing cloudiness on a glass substrate, and is consumed little in an etching operation, and to provide a method for producing the black matrix. SOLUTION: The etching solut...

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1. Verfasser: KOMATSU TOSHIO
Format: Patent
Sprache:eng
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