ETCHING SOLUTION AND METHOD FOR PRODUCING BLACK MATRIX

PROBLEM TO BE SOLVED: To provide an etching solution which is superior in etching precision, can provide a black matrix without causing cloudiness on a glass substrate, and is consumed little in an etching operation, and to provide a method for producing the black matrix. SOLUTION: The etching solut...

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1. Verfasser:	KOMATSU TOSHIO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING DIFFUSION TREATMENT OF METALLIC MATERIAL FREQUENCY-CHANGING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-LINEAR OPTICS NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an etching solution which is superior in etching precision, can provide a black matrix without causing cloudiness on a glass substrate, and is consumed little in an etching operation, and to provide a method for producing the black matrix. SOLUTION: The etching solution for producing the black matrix comprises ceric ammonium nitrate (composition (a)), perchloric acid and/or nitric acid (composition (b)), and a surface active agent. The surface active agent is a mixture (composition (c)) of a perfluoroalkyl sulfonate having a straight-chain fluorocarbon group in an amount of 60 mass% to 82 mass% and a perfluoroalkyl sulfonate having a branched-chain fluorocarbon group in an amount of 18 mass% to 40 mass%. The method for producing the black matrix includes using the etching solution. COPYRIGHT: (C)2008,JPO&INPIT