METHOD FOR MAKING PHOTOMASK

PROBLEM TO BE SOLVED: To provide a method for making a photomask necessary for manufacturing a semiconductor device, avoiding a risk of a short circuit or the like in a dummy region among elements, circuits or wells. SOLUTION: The method for making a photomask includes, as one embodiment of the pres...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	IGARASHI MOTOSHIGE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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