FILM-FORMING DEVICE

PROBLEM TO BE SOLVED: To provide a film forming device where occurrence of foreign matters is controlled at the time of forming an orientation film on a substrate and the orientation film can sufficiently be formed. SOLUTION: A film forming device is provided with a first room which stores the subst...

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description PROBLEM TO BE SOLVED: To provide a film forming device where occurrence of foreign matters is controlled at the time of forming an orientation film on a substrate and the orientation film can sufficiently be formed. SOLUTION: A film forming device is provided with a first room which stores the substrate and in which an orientation film can be formed on the stored substrate, a material supply part which is disposed in the first room and can supply a material for forming the orientation film on the substrate, a holding device which is arranged in the first room and attachably/detachably holds a prescribed member so that the prescribed member is disposed between the material and the substrate, a cleaning system which is installed in a position apart from the first room and can clean the prescribed member and a transportation system for transporting the prescribed member between the holding device of the first room and the cleaning system. COPYRIGHT: (C)2008,JPO&INPIT
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SOLUTION: A film forming device is provided with a first room which stores the substrate and in which an orientation film can be formed on the stored substrate, a material supply part which is disposed in the first room and can supply a material for forming the orientation film on the substrate, a holding device which is arranged in the first room and attachably/detachably holds a prescribed member so that the prescribed member is disposed between the material and the substrate, a cleaning system which is installed in a position apart from the first room and can clean the prescribed member and a transportation system for transporting the prescribed member between the holding device of the first room and the cleaning system. COPYRIGHT: (C)2008,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FREQUENCY-CHANGING
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
title FILM-FORMING DEVICE
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