CLEANING-DRYING APPARATUS

PROBLEM TO BE SOLVED: To provide a cleaning-drying apparatus which improves characteristics and yield of a semiconductor device by preventing metal impurities and particles or impurities in pure water from sticking to an object surface to be cleaned and by performing pure cleaning. SOLUTION: The cle...

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1. Verfasser:	SUGANO ITARU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a cleaning-drying apparatus which improves characteristics and yield of a semiconductor device by preventing metal impurities and particles or impurities in pure water from sticking to an object surface to be cleaned and by performing pure cleaning. SOLUTION: The cleaning-drying apparatus comprises: a first treatment tank which performs oxidizing treatment of the object surface with a cleaning liquid; a second treatment tank which performs cleaning treatment of the object surface to be cleaned with a diluted hydrochloric acid aqueous solution, where the object surface has been oxidized in the first treatment tank; and a drying treatment section which performs drying treatment of the object surface, where the object surface has been cleaned in the second treatment tank. COPYRIGHT: (C)2008,JPO&INPIT