PHOTORESIST SUPPLY DEVICE AND PHOTORESIST SUPPLY METHOD

PROBLEM TO BE SOLVED: To provide photoresist supply device/method for preparing photoresist whose concentration is correctly controlled at on-site and reducing supply cost of photoresist to a photoresist application device much more. SOLUTION: The photoresist supply device 1A is provided with a preparation container 3 for preparing photoresist of prescribed concentration, an undiluted solution delivery line 2 supplying photoresist of high concentration to the preparation container, a thinner supply flow path 6 supplying thinner to the preparation container 3, a photoresist supply line 4 supplying photoresist of prescribed concentration to the photoresist application device from the preparation container 3, a circulation passage 5 for mixing, which returns photoresist to the preparation container 3 from the photoresist supply line, and a concentration meter measuring photoresist concentration. A supply amount of high-concentration photoresist to the preparation container 3 to which thinner is previously supplied can be controlled based on the concentration meter 7. COPYRIGHT: (C)2008,JPO&INPIT