SUPPLY OF HIGH FLOW GaCl3

PROBLEM TO BE SOLVED: To provide equipment which supplies a high purity gallium trichloride in vapor phase to a reactor of a gallium nitride. SOLUTION: The equipment, which supplies a high purity gallium trichloride in vapor phase to a reactor of a gallium nitride, includes a supply source of a high...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BIRTCHER CHARLES MICHAEL, STEIDL THOMAS ANDREW, SENECAL LEE ARTHUR, CLARK ROBERT DANIEL
Format: Patent
Sprache:eng
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