SUPPLY OF HIGH FLOW GaCl3

PROBLEM TO BE SOLVED: To provide equipment which supplies a high purity gallium trichloride in vapor phase to a reactor of a gallium nitride. SOLUTION: The equipment, which supplies a high purity gallium trichloride in vapor phase to a reactor of a gallium nitride, includes a supply source of a high...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	BIRTCHER CHARLES MICHAEL, STEIDL THOMAS ANDREW, SENECAL LEE ARTHUR, CLARK ROBERT DANIEL
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide equipment which supplies a high purity gallium trichloride in vapor phase to a reactor of a gallium nitride. SOLUTION: The equipment, which supplies a high purity gallium trichloride in vapor phase to a reactor of a gallium nitride, includes a supply source of a high pressure carrier gas, a purifier which removes moisture from the carrier gas, a heater which can heat the carrier gas up to at least 80°C, a container which includes the supply of the gallium trichloride, a valve-controlled inlet for the carrier gas, having a dip tube with an exit lower than a level of the gallium trichloride, and a valve-controlled outlet for taking out the carrier gas and the gallium trichloride followed it, a heater which can sufficiently heat to melt the gallium trichloride, and a supply line which is connected to the valve-controlled outlet and carries the followed gallium trichloride to a reaction area for the gallium nitride. COPYRIGHT: (C)2008,JPO&INPIT