METHOD FOR FORMING FUNCTIONAL FILM AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE

PROBLEM TO BE SOLVED: To provide a method capable of forming a functional film which is free from streak, is uniform in film thickness and has a flat surface on a substrate by using a droplet ejection apparatus, and to provide a method for manufacturing a liquid crystal display device. SOLUTION: The...

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Bibliographische Detailangaben
Hauptverfasser:	HIRUMA TAKASHI, HASHIZUME AKINORI, ISHIDA KOHEI
Format:	Patent
Sprache:	eng
Schlagworte:	APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PERFORMING OPERATIONS PHYSICS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method capable of forming a functional film which is free from streak, is uniform in film thickness and has a flat surface on a substrate by using a droplet ejection apparatus, and to provide a method for manufacturing a liquid crystal display device. SOLUTION: The method for forming the function film is characterized in that the functional film is formed by ejecting a functional film forming composition containing a functional film forming material and an organic solvent by use of a droplet ejection apparatus onto a substrate having a surface roughness (Ra) of 2.3 nm or greater. The method for manufacturing a liquid crystal display includes a step of disposing a liquid crystal alignment film forming composition containing a liquid crystal alignment film forming material and an organic solvent on a transparent substrate having a transparent conductive film formed thereon, and the method is characterized in that a transparent substrate having a surface roughness (Ra) of 2.3 nm or greater of the transparent conductive film is used as the transparent substrate. COPYRIGHT: (C)2008,JPO&INPIT