LITHOGRAPHIC APPARATUS AND METHOD

PROBLEM TO BE SOLVED: To provide a technology of improving the distortion of a projected image produced by lenses heated up in a projection system. SOLUTION: A lithographic apparatus includes an illumination system configured to provide a beam of radiation, and a projection system 1 configured to pr...

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Bibliographische Detailangaben
Hauptverfasser:	ANTONIUS THEODORUS ANNA MARIA DERKSEN, ULRICH WILHELM, ZELLNER JOHANNES, WANGLER JOHANNES, DEUFEL PETER, DAVID CHRISTOPHER OCKWELL, SOHMEN ERIK MATTHIAS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a technology of improving the distortion of a projected image produced by lenses heated up in a projection system. SOLUTION: A lithographic apparatus includes an illumination system configured to provide a beam of radiation, and a projection system 1 configured to project the beam of radiation. The lithographic apparatus also includes a cooling system that is arranged to pass gas through the interior of the projection system 1 such that the throughput of gas through the interior of the projection system 1 is greater than 100 liters of gas per hour. COPYRIGHT: (C)2008,JPO&INPIT