EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide an exposure apparatus and a device manufacturing method whose throughput is made high when deflecting a charged beam having a wide area by its deflector. SOLUTION: In the exposure apparatus, a plurality of charged beams are subjected to the accelerating, focusing, and deflecting actions performed by a reduction optical system to irradiate a sample with the beams. The apparatus has an electrostatic deflector for generating an electric field which has a pair of electrodes provided oppositely to each other inside or just under the reduction optical system positioned just above the sample. Further, the exposure apparatus has a magnetic-field deflector for generating a magnetic field which has such a pair of coils provided oppositely to each other inside or just under the reduction optical system positioned just above the sample as to interpose the pair of electrodes between them. Moreover, the plurality of charged beams pass between the pair of electrodes. Furthermore, the electrostatic deflector and the magnetic-field deflector are so provided that the direction of the plurality of charged beams being arranged, the direction of the electric field, and the direction of the magnetic field overlap with each other in parallel with each other. COPYRIGHT: (C)2008,JPO&INPIT