WAFER SCALE METHOD OF MANUFACTURING OPTICAL WAVEGUIDE DEVICE AND THE WAVEGUIDE DEVICE MADE THEREBY

PROBLEM TO BE SOLVED: To provide a wafer scale method for the manufacture of optical waveguide devices, and the improved waveguides manufactured thereby. SOLUTION: Sub-micron control of an optical waveguiding layer thickness is achieved by providing a dimensionally stable wafer assembly into which a...

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Hauptverfasser: HULSE CHARLES A, DRAKE GLEN, MINFORD WILLIAM J, ZIEBA JERRY, FRIEDRICH DONALD M, KISSA KARL, CATCHING BENJAMIN F, DUNCAN JULIA, JIAZHAN XU JASON, SHA HIREN V, REED JASON, VON GUNTEN MARC K
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a wafer scale method for the manufacture of optical waveguide devices, and the improved waveguides manufactured thereby. SOLUTION: Sub-micron control of an optical waveguiding layer thickness is achieved by providing a dimensionally stable wafer assembly into which adhesive 16 can be introduced without altering the planar relationship between a carrier wafer 12 and an optically transmissive wafer in wafer scale manufacture. This process permits wafer scale manufacture of optical waveguide devices 10 including thin optically transmissive layers. A pattern of spacer pedestals is created by deposition and etch back, or by a surface etch process to precisely reference surface information from a master surface to a carrier wafer 12 to a thin optically transmissive wafer 14. COPYRIGHT: (C)2008,JPO&INPIT