METHOD AND APPARATUS OF POLISHING
PROBLEM TO BE SOLVED: To provide a method and an apparatus of polishing, wherein the repeatability of polishing accuracy is improved, while the repeatability of polishing accuracy becomes more and more difficult due to the enlargement of the size of workpices, and the accurate surface polishing is m...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!