METHOD AND APPARATUS OF POLISHING

PROBLEM TO BE SOLVED: To provide a method and an apparatus of polishing, wherein the repeatability of polishing accuracy is improved, while the repeatability of polishing accuracy becomes more and more difficult due to the enlargement of the size of workpices, and the accurate surface polishing is m...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: OBATA HIDEKI, BANDO YUTAKA, MATSUSHIMA YOHEI, OBATA TAKESHI
Format: Patent
Sprache:eng
Schlagworte:
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