APPARATUS FOR PROCESSING SUBSTRATE

PROBLEM TO BE SOLVED: To provide an apparatus for processing a substrate, in which the substrate is prevented from floating from a supporting roller for supporting the back surface of the substrate when the substrate to be inclined at a predetermined angle and conveyed is dried. SOLUTION: The appara...

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Bibliographische Detailangaben
1. Verfasser: HIROSE HARUMICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an apparatus for processing a substrate, in which the substrate is prevented from floating from a supporting roller for supporting the back surface of the substrate when the substrate to be inclined at a predetermined angle and conveyed is dried. SOLUTION: The apparatus for processing the substrate is provided with: a chamber; the supporting roller arranged in the chamber for supporting the back surface of the substrate being the lower surface of the inclined substrate; a driving roller on the outer peripheral surface of which the lower end of the substrate, the back surface of that is supported by the supporting roller, is supported and which is rotary driven to convey the substrate to a predetermined direction; air knives 61 arranged to be opposed to each other for covering almost the full length of the substrate in the height direction including the front and back surfaces of the substrate, namely, the upper and lower surfaces of the inclined substrate so that a gas is jetted from the air knives toward the upstream side in the conveying direction of the substrate; and front surface flow rectifying plates 64 which are arranged to be opposed to the front surface of the substrate on the upstream side of the air knives, which are arranged on the front surface of the substrate, in the conveying direction of the substrate so that the gas jetted from the air knives is made to flow along the front surface of the substrate. COPYRIGHT: (C)2008,JPO&INPIT