METHOD FOR FORMING TRANSPARENT ELECTROCONDUCTIVE FILM, AND FILM PROVIDED WITH TRANSPARENT ELECTROCONDUCTIVE FILM

PROBLEM TO BE SOLVED: To provide a method for forming a transparent electroconductive film such as ITO on a resin film substrate; a method for forming a film provided with the transparent electroconductive film showing a low ohmic value, excellent surface smoothness and high productivity; and the fi...

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Bibliographische Detailangaben
1. Verfasser:	TAKASHIMA NOBUHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CABLES CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONDUCTORS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INSULATORS METALLURGY SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method for forming a transparent electroconductive film such as ITO on a resin film substrate; a method for forming a film provided with the transparent electroconductive film showing a low ohmic value, excellent surface smoothness and high productivity; and the film provided with the transparent electroconductive film produced by the forming method. SOLUTION: This method for forming the transparent electroconductive film on the resin film substrate which is continuously transported includes: employing an ion-plating technique with the use of a pressure-gradient type plasma gun; making a support roll to contact with the back surface of the resin film substrate in a film-forming region, and to support and transport the resin film substrate; and controlling the temperature of the support roll into an optional fixed temperature between 130°C and 180°C. COPYRIGHT: (C)2008,JPO&INPIT